TETRAKIS(DIETHYLAMINO)HAFNIUM

• CAT Number: M009717
• CAS Number: 19824-55-6
• Molecular Formula: C16H40HfN4
• Molecular Weight: 467.01
• Purity: ≥95%
• Storage: -20°C
• IUPAC Name: diethylazanide;hafnium(4+)
• InChI: InChI=1S/4C4H10N.Hf/c4*1-3-5-4-2;/h4*3-4H2,1-2H3;/q4*-1;+4
• InChIKey: VBCSQFQVDXIOJL-UHFFFAOYSA-N
• SMILES: CC[N-]CC.CC[N-]CC.CC[N-]CC.CC[N-]CC.[Hf+4]

Tetrakis(diethylamino)hafnium (Cat No.: M009717) is a metalorganic compound used primarily as a precursor in atomic layer deposition (ALD) processes for producing hafnium-containing thin films. Featuring four diethylamino ligands bonded to a central hafnium atom, it offers high volatility and thermal stability, ideal for fabricating high-k dielectric materials in advanced semiconductor devices. Its precise deposition control is crucial for applications in microelectronics, especially in gate oxides and capacitors. This compound plays a critical role in enhancing device performance and scaling in nanoelectronics manufacturing.