For research use only. Not for therapeutic Use.
Tetrafluorosilane (SiF4) is a colorless, highly reactive gas composed of one silicon atom and four fluorine atoms. It is primarily used in the semiconductor industry for plasma etching and as a precursor for the deposition of silicon-based thin films. Tetrafluorosilane is also employed in the production of fluorosilicates and other specialized silicon compounds. Due to its reactivity, it must be handled with caution, as it can decompose to form hazardous byproducts, including hydrofluoric acid when in contact with moisture. Its role in advanced material processing makes Tetrafluorosilane an important compound in high-tech manufacturing applications.
| Catalog Number | M005514 |
| CAS Number | 7783-61-1 |
| Synonyms | SILICON TETRAFLUORIDE;SILICIUM TETRAFLUORIDE;Silicon fluoride;SILICON (IV) FLUORIDE;TETRAFLUOROSILANE;perfluorosilane;SiF4;Silane, tetrafluoro- |
| Molecular Formula | SiF4 |
| Purity | ≥95% |
| Storage | Room temperature |
| IUPAC Name | tetrafluorosilane |
| InChI | InChI=1S/F4Si/c1-5(2,3)4 |
| InChIKey | ABTOQLMXBSRXSM-UHFFFAOYSA-N |
| SMILES | F[Si](F)(F)F |
